发明名称 |
PHOTOSENSITIVE RESIN COMPOSITION |
摘要 |
A photosensitive composition comprising, (A) an oligomer or polymer containing at least one carboxylic acid group in the molecule and having a molecular weight of 200'ooo or less; (B) at least one photoinitiator compound of formula I, R>1<, is lenear or banched C>1<-C>12<alkyl; R>2< is linear or branched C>1<-C>4<alkyl; R>3< and R>4< independently of one another are linear or branched C>1<-C>8<alkyl; and (C) a monomeric, oligoneric or polymeric compound having at least one olefinic double bond, is especially suitable for preparting photoresists, in particular color filters.
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申请公布号 |
WO03010602(A1) |
申请公布日期 |
2003.02.06 |
申请号 |
WO2002EP07989 |
申请日期 |
2002.07.18 |
申请人 |
CIBA SPECIALTY CHEMICALS HOLDING INC.;KURA, HISATOSHI;OKA, HIDETAKA;OHWA, MASAKI |
发明人 |
KURA, HISATOSHI;OKA, HIDETAKA;OHWA, MASAKI |
分类号 |
C08F2/50;G02B5/20;G03F7/00;G03F7/004;G03F7/031;H01L21/027;H01L51/50;H05B33/10;(IPC1-7):G03F7/031 |
主分类号 |
C08F2/50 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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