| 摘要 |
<p>A method of making a polycrystalline structure film (22) includes causing metallic atoms and compounds to deposit over the surface of a substrate (21). When the metallic atoms and the molecules of the compounds are simultaneously deposited on the substrate (21), fine and smallest metallic nucleation sites (27) can be formed over the surface of the substrate (21) at a higher density per unit area. Subsequent deposition of metallic atoms enables generation of fine and smallest crystal grains (29) consisting of the metallic atoms.</p> |
