APPARATUS FOR PREVENTING BACK STREAM OF PARTICLES IN SEMICONDUCTOR FABRICATION EQUIPMENT

摘要

PURPOSE: An apparatus for preventing back stream of particles in semiconductor fabrication equipment is provided to prevent a back stream phenomenon of particles from a pump line into a chamber by intercepting a pump line before a vacuum control valve is closed. CONSTITUTION: A vacuum pump(40) is used for performing a pumping operation to form a vacuum state of a chamber(20). A vacuum control valve(22) is used for controlling a degree of vacuum of the chamber(20). A gate valve(38) is opened when the vacuum pump(40) perform the pumping operation. The first ball(26) is used for intercepting back stream of the first pump line(42). The first ball bracket(24) is formed on the first pump line(42) in order to intercept the first pump line(42). The second ball bracket(28) is formed on the first pump line(42) in order to receive the first ball(26). The second ball(32) is used for intercepting back stream of the second pump line(44). The third ball bracket(30) is formed on the second pump line(44) in order to intercept the second pump line(44). The fourth ball bracket(34) is formed on the second pump line(42) in order to receive the second ball(32).