EVAPORATION APPARATUS OF INJECTION GAS FOR SEMICONDUCTOR FABRICATION

摘要

PURPOSE: An evaporation apparatus of an injection gas for semiconductor fabrication is provided to exhaust easily a mixed gas of a carrier gas and a source gas by enlarging an inside diameter of an outflow hole and increasing temperature of carrier gas. CONSTITUTION: A control valve(20) is installed on an upper portion of a main body(10). A metal seal(30) is sealed between the control valve(20) and the main body(10). A source gas introduction hole(12) is formed in the main body(10). A carrier gas inflow hole(13) and a reaction gas outflow hole(14) are formed at both sides of the ring-shaped flux path(11). The reaction gas outflow hole(14) has a cone-shaped entrance. The carrier gas supplied to the ring-shaped flux path(11) has a higher temperature than room temperature. A heater(40) is installed at a supply line connected with the carrier gas inflow hole(13).