| 摘要 |
PURPOSE: Provided are an exposure device for photography which can effectively carry out the photolithography and thus reduce the time of photolithography, and a method for driving the same. CONSTITUTION: The exposure device for photography comprises an aligning part for aligning a flat zone and a core of wafer; an edge exposure part for exposing the edge of the wafer; and a robot arm for loading or unloading the wafer. The method comprises the steps of (100) coating the wafer with photoresist; (200) loading the wafer coated with the photoresist on the aligning part by using the robot arm; (300) aligning a direction of the core and flat zone of the loaded wafer by using the aligning part; (400) exposing the edge area of the wafer by using the edge exposure part; transferring the wafer to main exposure device to exposing the chip area; and (500) developing photoresist of the chip and edge area. |
