| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate cleaning system which can clean a substrate favorably and effectively. SOLUTION: Fine frozen particles 1b comprising raw material water 1 are mixed with a cleaning liquid 3 whose coagulating point is lower than that of water and which is kept at the temperature lower than the water coagulating point. The cleaning slurry 4 obtained is sprayed to make collide by a spray gun 34 toward a substrate 6 in a cleaning treatment chamber 7. The cleaning liquid is preferably isopropyl alcohol, methyl alcohol, ethyl alcohol, acetone, a mixed liquid of water and ethyl alcohol or a mixed liquid of water and acetone.
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