发明名称 |
Carrier head for chemical mechanical polishing a substrate |
摘要 |
A carrier head for a chemical mechanical polishing apparatus includes a flexible membrane with a lip portion to engage a substrate to form a seal for improved vacuum-chucking.
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申请公布号 |
US6514124(B1) |
申请公布日期 |
2003.02.04 |
申请号 |
US20000693618 |
申请日期 |
2000.10.20 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
ZUNIGA STEVEN;CHEN HUNG;BIRANG MANOOCHER |
分类号 |
B24B37/04;B24B41/06;H01L21/304;(IPC1-7):B24B1/00 |
主分类号 |
B24B37/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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