| 摘要 |
<p>PURPOSE:To prevent adhesion of the atmosphere, gaslike impurity, etc., to a material to be treated by carrying in/carrying out of a treating apparatus without exposing the material to be treated to the atmosphere by providing a cover to be switched to be opened or closed for maintaining an inert gas atmosphere in a box for detachably containing the material to be treated by blocking the box in a sealed state. CONSTITUTION:A material-to-be-treated conveying box 9 contains a cassette 11 for containing to hold many semiconductor wafers 5 in a parallel state and is conveyed. The box 9 has a box body 12, a cover 14 for blocking the body 12 in a sealed state through a sealing material 13 at a bottom and to be operated to be opened or closed, and a normally closed inert gas vent valve 15 at a sidewall. The wafers 5 contained in an N2 gas atmosphere are placed on the cover 14 of the box 9, covered with the body 12, inner N2 gas is suitably sucked by the valve 15, and sealed. Thus, the wafers 5 contained in the cassette 11 can be conveyed to a treating apparatus without exposure to the atmosphere.</p> |
