发明名称 |
Laser irradiating device and laser irradiating method |
摘要 |
To restrain nonuniformity of irradiation when a linear laser beam is irradiated by scanning the beam, linear laser pulses are irradiated by scanning the pulses in an oblique direction by which irradiation is carried out without overlapping peaks periodically present in the longitudinal direction of the linear laser beam and accordingly, nonuniformity of irradiation can be restrained.
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申请公布号 |
US6516009(B1) |
申请公布日期 |
2003.02.04 |
申请号 |
US20000704386 |
申请日期 |
2000.10.31 |
申请人 |
SEMICONDUCTOR ENERGY LABORATORY CO., LTD. |
发明人 |
TANAKA KOICHIRO |
分类号 |
H01L21/268;G02F1/29;H01S3/00;(IPC1-7):H01S3/10 |
主分类号 |
H01L21/268 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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