| 摘要 |
A system for indicating an amount of a process liquid contained within an interior of an ampoule. A first conduit is in selective fluid communication with the interior of the ampoule, and has a first opening configured for disposal below an upper surface of the process liquid. The first conduit introduces a carrier gas into the interior of the ampoule. A second conduit is also in selective fluid communication with the interior of the ampoule, and has a second opening configured for disposal above the upper surface of the process liquid. The second conduit receives the carrier gas from the interior of the ampoule. A pressure differential sensor is disposed between and is in selective fluid communication with the first conduit and the second conduit. The pressure differential sensor senses a pressure differential between the first conduit and the second conduit. An indicator indicates the amount of the process liquid in the ampoule, based at least in part upon the pressure differential between the first conduit and the second conduit. Thus, the system as described above provides selectively continuous monitoring of the amount of the process liquid that is in the ampoule. Furthermore, the system monitors the amount in real time, and is relatively inexpensive to implement in a new chemical vapor deposition system, or to add to an existing chemical vapor deposition system.
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