发明名称 |
Integrated circuit with borderless contacts |
摘要 |
An integrated circuit comprising a conductive region formed on a semiconductor substrate, a silicate glass layer formed on the conductive region, and an etch stop layer formed on the silicate glass layer. The integrated circuit also includes a borderless contact that is coupled to the conductive region.
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申请公布号 |
US6515351(B2) |
申请公布日期 |
2003.02.04 |
申请号 |
US20010796925 |
申请日期 |
2001.02.28 |
申请人 |
INTEL CORPORATION |
发明人 |
ARAFA MOHAMED;THOMPSON SCOTT |
分类号 |
H01L21/60;H01L21/768;(IPC1-7):H01L23/58 |
主分类号 |
H01L21/60 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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