发明名称 Integrated circuit with borderless contacts
摘要 An integrated circuit comprising a conductive region formed on a semiconductor substrate, a silicate glass layer formed on the conductive region, and an etch stop layer formed on the silicate glass layer. The integrated circuit also includes a borderless contact that is coupled to the conductive region.
申请公布号 US6515351(B2) 申请公布日期 2003.02.04
申请号 US20010796925 申请日期 2001.02.28
申请人 INTEL CORPORATION 发明人 ARAFA MOHAMED;THOMPSON SCOTT
分类号 H01L21/60;H01L21/768;(IPC1-7):H01L23/58 主分类号 H01L21/60
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