发明名称 |
Technique for determining curvatures of embedded line features on substrates |
摘要 |
Techniques for evaluating curvatures in line features embedded in a different material layer formed on a substrate. A model based a uniform layer formed over a substrate may be used to represent a structure with parallel line features embedded in a layer formed over the substrate. The curvatures of the uniform layer due to an elastic distortion along a first direction substantially parallel to the line features and along a second direction orthogonal to the first direction are determined. Next, the curvatures of the uniform layer may be used as respective curvatures of each of the line features.
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申请公布号 |
US6513389(B2) |
申请公布日期 |
2003.02.04 |
申请号 |
US20010843612 |
申请日期 |
2001.04.25 |
申请人 |
CALIFORNIA INSTITUTE OF TECHNOLOGY |
发明人 |
SURESH SUBRA;PARK TAE-SOON |
分类号 |
H01L21/66;H01L21/02;H01L21/3205;H01L23/544;(IPC1-7):G01N3/00;G01N25/16;G01B11/24;G01B21/20 |
主分类号 |
H01L21/66 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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