| 发明名称 |
Cyclic acetal compound, polymer, resist composition and patterning process |
| 摘要 |
Cyclic acetal compounds of formula (1) wherein k=0 or 1 and n is an integer of 0 to 6 are novel. Using the cyclic acetal compounds as a monomer, polymers are obtained. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation and has excellent sensitivity, resolution, and etching resistance.
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| 申请公布号 |
US6515150(B2) |
申请公布日期 |
2003.02.04 |
| 申请号 |
US20010967946 |
申请日期 |
2001.10.02 |
| 申请人 |
SHIN-ETSU CHEMICAL CO., LTD. |
发明人 |
NAKASHIMA MUTSUO;TACHIBANA SEIICHIRO;WATANABE TAKERU;KINSHO TAKESHI;HASEGAWA KOJI;NISHI TSUNEHIRO;HATAKEYAMA JUN |
| 分类号 |
G03F7/027;C07D317/24;C08F232/08;G03F7/004;G03F7/039;(IPC1-7):C07D317/26;C07D319/06 |
主分类号 |
G03F7/027 |
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