| 摘要 |
The invention provides a semiconductor wafer cleaving method and apparatus which are used to obtain an ideal vertical cleaved plane of semiconductor wafers. A semiconductor wafer (1) having a scribing mark (2) inscribed on the surface is set on fulcrum members (6a and 6b). The fulcrum members (6a and 6b) are left-right symmetrical centering around the scribing mark (2) and parallel to the scribing mark (2). Fulcrum members (4a and 4b) are disposed left-right symmetrically centering around the scribing mark (2) and in parallel to the scribing mark (2) on the upper side of the semiconductor wafer (1). The fulcrum members (4a and 4b) are disposed outside the fulcrum members (6a and 6b). Load is applied from the fulcrum members (4a and 4b) side, wherein fulcrum forces are caused to operate from the respective fulcrum members (4a, 4b, 6a and 6b) onto the semiconductor wafer (1). A shearing force becomes zero in an area of the semiconductor wafer (1) between the fulcrum members (6a and 6b), wherein the maximum main stress of bending tension is actuated in a direction orthogonal to the perpendicular plane of the scribing mark (2), thereby cleaving the semiconductor wafer (1).
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