发明名称 METHOD FOR MANUFACTURING MAGNETIC STORAGE DEVICE
摘要 PROBLEM TO BE SOLVED: To allow a processing accuracy of a tunnel magnetoresistance effect element (TMR element) and a formation of a self-aligning connecting part to be compatible without necessity of a special pattern forming technique. SOLUTION: A method for manufacturing a magnetic storage device comprises a step of processing a magnetoresistance effect film 15 having a tunnel barrier layer 13 interposed between a magnetization fixing layer 12 and a storage layer 14 in a predetermined element shape. A mask layer (plating layer 20) is formed in the predetermined element shape in such a manner that the mask layer is formed by a plating method.
申请公布号 JP2003031772(A) 申请公布日期 2003.01.31
申请号 JP20010213438 申请日期 2001.07.13
申请人 SONY CORP 发明人 NARISAWA KOSUKE;ENDO KEITARO;KUBO SHINYA
分类号 H01L27/105;B05D1/32;B05D5/12;H01L21/8246;H01L27/22;H01L43/08;H01L43/12;(IPC1-7):H01L27/105 主分类号 H01L27/105
代理机构 代理人
主权项
地址