发明名称 |
METHOD FOR MANUFACTURING MAGNETIC STORAGE DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To allow a processing accuracy of a tunnel magnetoresistance effect element (TMR element) and a formation of a self-aligning connecting part to be compatible without necessity of a special pattern forming technique. SOLUTION: A method for manufacturing a magnetic storage device comprises a step of processing a magnetoresistance effect film 15 having a tunnel barrier layer 13 interposed between a magnetization fixing layer 12 and a storage layer 14 in a predetermined element shape. A mask layer (plating layer 20) is formed in the predetermined element shape in such a manner that the mask layer is formed by a plating method.
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申请公布号 |
JP2003031772(A) |
申请公布日期 |
2003.01.31 |
申请号 |
JP20010213438 |
申请日期 |
2001.07.13 |
申请人 |
SONY CORP |
发明人 |
NARISAWA KOSUKE;ENDO KEITARO;KUBO SHINYA |
分类号 |
H01L27/105;B05D1/32;B05D5/12;H01L21/8246;H01L27/22;H01L43/08;H01L43/12;(IPC1-7):H01L27/105 |
主分类号 |
H01L27/105 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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