| 摘要 |
PROBLEM TO BE SOLVED: To provide a device which enables highly precise mutual adjustment of each member and highly precise adjustment for setting. SOLUTION: An apparatus for adjusting a device in particular an optical element regarding semiconductor lithography and for setting an adjustment device, in particular in aμm range, nm range and below, comprises a base (2) and a head (3) spaced apart therefrom. The two parts are connected to one another by at least one adjustment device (1), the angle of which, or the spacing between which, can be adjusted or set by a length-adjustment device, which has side parts (10, 11).
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