发明名称 SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
摘要 PROBLEM TO BE SOLVED: To stably provide a low on-resistance bipolar transistor having sufficient performance with simple manufacturing process. SOLUTION: A base 5 and a high concentration ohmic diffusion zone 11 for a collector are formed in a collector 3 at intervals, an emitter 7 and a high concentration ohmic diffusion zone 9 for a base are formed in the base 5 at intervals, and a gate electrode 15 is formed over the collector 3 and the base 5 adjacent to the emitter 7 at intervals with a high concentration ohmic diffusion zone 11 for a collector through the gate oxide film 13. The high concentration ohmic diffusion zone 9 for a base and the gate electrode 15 are connected to an input terminal 29 and kept in the same potential through a base wiring 25 or a gate electrode wiring 27. In an ON state, no high voltage is applied to the gate electrode 15 because the potential from the base 5 to the emitter 7 is forward and the potential between the base 5 and the gate electrode 15 is same. This suppresses breakages of the gate oxide film 13.
申请公布号 JP2003031709(A) 申请公布日期 2003.01.31
申请号 JP20010219446 申请日期 2001.07.19
申请人 RICOH CO LTD 发明人 NEGORO TAKAAKI
分类号 H01L21/331;H01L21/8249;H01L27/06;H01L29/73;(IPC1-7):H01L21/824 主分类号 H01L21/331
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