| 摘要 |
PROBLEM TO BE SOLVED: To provide a wafer-cleaning apparatus that can surely clean both the surfaces of a wafer by quickly detecting the distribution state of particles to both the sides of the wafer. SOLUTION: The wafer-cleaning apparatus is equipped with an indexer section 11, a pair of front-cleaning sections 15 for cleaning the front of a wafer W, a pair of back-cleaning sections 16 for cleaning the back of the wafer W, a pair of particle inspection sections 17 for detecting the distribution state of a particle that adheres to the wafer W, an inverting section 18 for inverting the wafer W so that the front and back of the wafer W can face up and down, respectively, a conveyance section 14 comprising a pair of conveyance units 12 and 13 for conveying the wafer W among the indexer section 11, surface- cleaned section 15, back-cleaning section 1, particle inspection section 17, and inverting section 18, and a chemical cabinet for accommodating a chemical liquid tank, piping, or the like.
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