| 摘要 |
PROBLEM TO BE SOLVED: To reduce manufacturing cost by eliminating the need for an ultravio let lamp, to disperse with the down time of a machine due to replacement of the ultraviolet lamp to be eliminated, and to improve the workability. SOLUTION: An apparatus for surface treating of the substrate for an FPD comprises a pair of electrodes 2, 2 disposed opposite, at a passing ga H for passing to transfer the substrate in a plasma treating chamber 1, in order to modify wettability of a surface of the substrate K for the FPD or to remove a contaminant substance, and a plasma generating means 3 for generating a plasma at atmospheric pressure or a reduced pressure between the pair of the electrodes. |
