发明名称 NONVOLATILE SEMICONDUCTOR MEMORY DEVICE AND METHOD FOR MANUFACTURING THE SAME
摘要 PROBLEM TO BE SOLVED: To meet both needs of a high voltage-resistant transistors requiring no current driving force and transistors requiring no high voltage resistance with requiring current driving force in a nonvolatile memory device. SOLUTION: The nonvolatile semiconductor memory device comprises a semiconductor wafer 1 having a main surface, and a plurality of transistors formed on the main surface. The transistors respectively comprise a gate electrode, a diffusion layer formed adjacent to the gate electrode, and a contact connected to the diffusion layer. Some of all the contacts corresponding to a plurality of transistors have a first distance from the gate electrode and a second distance longer than the first distance.
申请公布号 JP2003031701(A) 申请公布日期 2003.01.31
申请号 JP20010213320 申请日期 2001.07.13
申请人 MITSUBISHI ELECTRIC CORP 发明人 NISHIOKA NAHO
分类号 H01L21/8247;H01L21/768;H01L21/8234;H01L21/8238;H01L21/8246;H01L27/088;H01L27/10;H01L27/105;H01L27/115;H01L29/788;H01L29/792;(IPC1-7):H01L21/824;H01L21/823 主分类号 H01L21/8247
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