| 摘要 |
PROBLEM TO BE SOLVED: To obtain a long-life and stable light source apparatus and an exposure system having the same by solving a problem of damage or control anomaly by the contamination in the shutter device of a light source unit in the light source apparatus integrated in the exposure system. SOLUTION: A driving motor for shutter blades of the shutter device in the light source unit and peripheries of the driving motor are isolated and are enclosed, and contaminants existing in the enclosed part are exhausted by using a cooling medium for cooling the motor, in the light source apparatus integrated in the exposure system.
|
