发明名称 MANUFACTURING METHOD AND MANUFACTURING DEVICE OF DIELECTRIC LAYER
摘要 PROBLEM TO BE SOLVED: To provide a manufacturing method that can manufacture a dielectric layer in which a sufficient degassing effect can be obtained while eliminating the process of such as decreasing the throughput and a high transmittance and light-emitting luminance can be obtained when adopted for a PDP. SOLUTION: A dielectric material is formed into a dielectric layer by housing a substrate 110 applied with a paste containing the dielectric material in a firing furnace 100A and by heating and firing the paste. This manufacturing method comprises a process that reduces the pressure of the firing environment before the temperature of the firing environment in the firing furnace 100A reaches the reaction temperature for softening and melting the dielectric material, a process for increasing the pressure of the firing environment at a prescribed timing, while maintaining the reaction temperature after reaching the reaction temperature, and a process for lowering the reaction temperature up to the solidifying temperature at which the melted dielectric material is solidified, while maintaining the pressure higher than the increased pressure of the firing environment.
申请公布号 JP2003031117(A) 申请公布日期 2003.01.31
申请号 JP20010209269 申请日期 2001.07.10
申请人 NEC CORP 发明人 YOSHIOKA TOSHIHIRO;MIYAKOSHI AKIRA
分类号 C03C17/00;C23C10/28;C23C24/10;C23C26/02;H01J9/02;H01J11/02;H01J11/22;H01J11/34;H01J11/38;(IPC1-7):H01J9/02 主分类号 C03C17/00
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