| 摘要 |
An ultraviolet radiation generating system for treating an ultraviolet-reactive substance on a substrate. The system comprises a chamber having a wall, a plasma lamp mounted within the chamber in a confronting relationship with an interior surface of the wall, and a reflector positioned between the plasma lamp and the wall. When excited by energy from an excitation power source, the plasma lamp is capable of emitting radiation of infrared and ultraviolet wavelengths. The reflector is capable of reflecting ultraviolet radiation from the plasma lamp toward the substrate and transmitting infrared radiation such that the infrared radiation irradiates the interior surface of the wall. The interior surface is at least partially covered with an infrared-absorptive coating capable of absorbing infrared radiation incident thereon so that reflection therefrom is significantly reduced or eliminated. The reflector may be capable of absorbing infrared radiation that is reflected from the interior surface of the wall with optical paths directed toward a rear surface of the reflector.
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