发明名称 |
Exposure apparatus and method, and device fabricating method |
摘要 |
An exposure apparatus includes a projection optical system for projecting a pattern created on a mask onto an object, the projection optical system having a numerical aperture on a side of the object is 0.7 or higher; and a shielding plate for shielding around an area onto which the pattern on the mask is projected at the time of projection.
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申请公布号 |
US2003020893(A1) |
申请公布日期 |
2003.01.30 |
申请号 |
US20020186055 |
申请日期 |
2002.06.28 |
申请人 |
KAWASHIMA HARUNA |
发明人 |
KAWASHIMA HARUNA |
分类号 |
G03F7/20;G03F7/22;H01L21/027;(IPC1-7):G03B27/42 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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