| 摘要 |
The invention is about a support for the production of microelectronic, microoptoelectronic or micromechanical devices. Said support (10; 60) comprises a base (11; 61) having the function of backing element, on which is deposited a gas absorbing material in form of discrete deposits (13, 13',...; 63, 63',...) that are at least partially exposed to the atmosphere present around said support (10; 60). |
