| 摘要 |
A semiconductor device including an insulating film, a plurality of word lines parallel to one another, a gate insulating film and a first conductivity type semiconductor layer that are formed in this order, wherein the surface of said insulating film is rendered flat with respect to the surface of the word lines, and the first conductivity type semiconductor layer includes bit lines comprising a plurality of second conductivity type high concentration impurity diffusion layers crossing the word lines and parallel to one another. <IMAGE>
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