| 摘要 |
<p>It is described in different embodiments thereof a support (10; 20) for manufacturing microelectronic, microoptoelectronic or micromechanical devices requiring gas absorption for their correct operation, comprising a mechanical supporting base (11; 21), a layer (13) of a gas absorbing material on the base and a layer for temporary protection of the gas absorbing material, that is removed during the manufacture of the devices.</p> |
