ETCHING PROCESS FOR MICROMACHINING CRYSTALLINE MATERIALS AND DEVICES FABRICATED THEREBY
摘要
<p>The present invention provides an optical microbench having intersecting structures etched into a substrate. In particular, microbenches in accordance with the present invention include structures having a planar surfaces formed along selected crystallographaich planes of a single crystal substrate. Two of the structures provided are an etch-stop pit and an anisotropically etched feature disposed adjacent the etch-stop pit. At the point of intersection between the etch-stop pit and the anisotropically etched feature the oreintation of the crystallographic planes is maintained. The present invention also provides a method for micromachining a substrate to form an optical microbench. The method comprises the steps of forming an etch-stop pit and forming an anisotropically etched feature adjacent the etch-stop pit. The method may also comprise coating the surfaces of the etch-stop it with an etch-stop layer.</p>
申请公布号
WO03008139(A2)
申请公布日期
2003.01.30
申请号
WO2002US23177
申请日期
2002.07.19
申请人
SHIPLEY COMPANY, L.L.C.;STEINBERG, DAN, A.;RASNAKE, LARRY, J.