SPUTTERING TARGET AND TRANSPARENT CONDUCTIVE FILM

摘要

A sputtering target containing a hexagonal system laminar compound the composition of which is expressed by In2O3(Zn0)m(where m represents an integer of 2 to 7)composed of indium oxide and zinc oxide and 0.01 to 1 atom% of an oxide of a third element having a valence of plus 4.A transparent conductive film formed using the sputtering target is also disclosed.Thus a sputtering target for sputtering with good stability having a low volume resistivity and a transparent conductive film formed by using the sputtering target and excellent in etchability are provided.