| 摘要 |
An exposure apparatus includes a condensing optical system for condensing light from a light source to a specified plane, an imaging optical system for imaging the light in the specified plane onto a reticle or a mask or near the reticle or mask, a projection optical system for projecting a pattern on the reticle or the mask onto an object to be exposed; and a beam splitting member that is provided between the condensing optical system and the specified plane, and generates a split beam, wherein 18.3°<=theta<=36.4°, 1.0<=|B|<=2.5 and 0.16<=NA2<=0.23 are met where theta is an angle formed between a splitting plane in the beam splitting member and a plane perpendicular to an optical axis, B is the magnification of the imaging optical system, and NA2 is a maximum numerical aperture on a light exit side of the imaging optical system.
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