发明名称 VACUUM DEPOSITION SYSTEM
摘要 PROBLEM TO BE SOLVED: To provide a vacuum deposition system which is capable of forming a dense and high-quality film to a large area on a base material. SOLUTION: A cluster evaporation source 3 is used as an evaporation source for evaporating the raw material of the film. Electric power is supplied into a chamber 2 through a base material holder 5 for holding the base material 15 from a rear surface side, by which the clusters spouted from the cluster evaporation source 3 are cluster ionized and the film is formed on the base material 15.
申请公布号 JP2003027222(A) 申请公布日期 2003.01.29
申请号 JP20010210661 申请日期 2001.07.11
申请人 SHIN MEIWA IND CO LTD 发明人 KAMIYA KAZUO
分类号 C23C14/32;(IPC1-7):C23C14/32 主分类号 C23C14/32
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