| 摘要 |
PURPOSE: An inline system having a function for measuring an overlay and a method for measuring an overlay are provided to reduce a time for measuring the overlay and simplify a measuring work by performing a process for measuring the overlay according to an inline method. CONSTITUTION: A spinner(10), a stepper(20), and an overlay measurer(31) are connected to each other by an inline method. The overlay measurer(31) is connected with the spinner(10) by the inline method. Accordingly, an overlay is automatically measured on a wafer when a development process for a wafer is finished. A coating process, an alignment process, an exposure process, and a development process are serially performed at the first to the fourth step(S1,S2,S3,S4). The process for measuring the overlay is performed the fifth step(S5).
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