| 摘要 |
PROBLEM TO BE SOLVED: To provide a resist material comprising a polymer compound as a base resin, the material being useful for a microwork by an electron ray or a far-ultraviolet ray, because the material perceives a high energy ray and is excellent in sensitivity, resolving properties and etching resistance. SOLUTION: The polymer compound having a weight-average molecular weight of 1,000-500,000 which has a repeating unit represented by formulas (1-1) and (1-2) (wherein R<1> is a hydrogen atom, or a 1-15C straight-chain shape, branched shape, or ring shape hydroxyalkyl group, alkoxyalkyl group, or alkoxycarbonly group, and a part or the whole of hydrogen atoms on constituent carbon atoms may be substituted with a halogen atom; and k is 0 or 1). |
