| 摘要 |
PROBLEM TO BE SOLVED: To improve vacuum treatment rate, vacuum treatment characteristic, and the reproducibility of the vacuum treatment characteristic, to maintain the uniformity of the vacuum treatment characteristic to a very high level, and to reduce the vacuum treatment cost. SOLUTION: In a method for treating a work by plasma formed by simultaneously feeding the high-frequency power of the frequencies different from each other to the same feed point on a same high-frequency electrode, the main transmitting direction of the high-frequency power transmitted on at least one high-frequency electrode is different from the main transmitting direction of the high-frequency power transmitted on the other high-frequency electrode, a plurality of high frequency powers include at least two high-frequency powers of the frequency of >=10 MHz to <=250 MHz, and for the high-frequency power having the highest power value and the second highest power value among the high-frequency powers in the frequency range, the power values P1 and P2 satisfy the inequalities 0.1<=P2/(P1+P2)<=0.9, where f1 and P1 are the frequency and the power value of the high-frequency power of the highest frequency, and f2 and P2 are the frequency and the power value of the high-frequency power of the second highest frequency.
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