| 摘要 |
PROBLEM TO BE SOLVED: To provide a photosensitive resin composition which has high sensitivity and can obtain high contrast patterns with a high film retention, simultaneously excels in the resolution of fine patterns and the pattern shape and, in addition, excels in stability. SOLUTION: The photosensitive resin composition is obtained dissolving a photosensitive polyamide to be represented by the formula (wherein X1 is a tetravalent organic group; X2 and X3 are each a divalent organic group; a+b is 100 mol%; a is 60.0-100 mol%; b is 0-40 mol%; D is a 1,2- naphthoquinonediazido-4(or 5)-sulfonic ester residure or a hydrogen atom, and the 1,2-naphthoquinonediazido-4(or 5)-sulfonic ester residue is 1-50% of the entire D; and Z is a divalent organic group) in a solvent. |
