MASK, PATTERN FORMING METHOD USING THE SAME, AND LITHOGRAPHY

摘要

PROBLEM TO BE SOLVED: To provide a mask capable of forming steps different from each other in layer thickness and excellent in intrasurface uniformity in a resist by a general exposure system. SOLUTION: The photomask 1 used for exposing a photosensitive resin layer 7 stacked on a substrate 6 to form a latent image in the layer 7 consists of a transparent support 2 and opaque light shielding parts 3 and a transmissive part 4 disposed on the support 2, and the transmissive part 4 has a first transmissive wavelength selective region 4a and a second transmissive wavelength selective region 4b different from each other in the wavelength region of transmitted light.