| 摘要 |
PURPOSE: A method of engraving or embossing patterns of character and figure of various colors on a precious metal in various methods using semiconductor etching process. CONSTITUTION: The silicon printing method using semiconductor etching process comprises first process of coating a resist(2) on a silicon wafer(1); second process of resting a chromium mask(3) on the resist(2); third process of patterning the resist(2) using a light exposing equipment; fourth process of etching the silicon wafer(1) using etching process; fifth process of removing the resist(2); sixth process of forming a plating layer(4) by depositing or plating a precious metal such as gold or silver on the resist(2) removed etched silicon wafer(1); seventh process of coating the resist(2) again over the silicon wafer; eighth process of patterning the resist(2) using the light exposing equipment; ninth process of forming a dissimilar color plating layer(5) by depositing or plating the precious metal of gold or silver on patterned resist(2); and tenth process of removing the resist(2).
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