发明名称 |
ELECTROSTATIC CHUCK FOR IMPROVING CHUCKING PERFORMANCE OF EDGE PORTION |
摘要 |
PURPOSE: An electrostatic chuck for improving chucking performance of an edge portion is provided to improve the chucking performance of the edge portion by forming a dielectric layer of the edge portion thinner than the dielectric layer of a center portion. CONSTITUTION: An electrostatic chuck(30) is formed with an electrostatic chuck body(31), an insulating layer(32), an electrode(33), and a dielectric body(34). The insulating layer(32) is used for insulating the electrode(33) and the electrostatic chuck body(31). The electrostatic chuck body(31) is formed with Al. The electrode(33) has a ring-shaped step portion since an edge portion of the electrode(33) is thicker than a center portion of the electrode(33). The electrode(33) is formed by coating Al on an upper face of the insulating layer(32). The dielectric layer(34) is formed on an upper face of the electrode(33). The dielectric layer(34) is formed by coating ceramic particles on electrode(33). The dielectric layer(34) has a cooling line(35).
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申请公布号 |
KR20030008724(A) |
申请公布日期 |
2003.01.29 |
申请号 |
KR20010043579 |
申请日期 |
2001.07.19 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
BAE, DO IN;KIM, GUK GWANG;LEE, TAE WON |
分类号 |
H01L21/68;(IPC1-7):H01L21/68 |
主分类号 |
H01L21/68 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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