| 摘要 |
PROBLEM TO BE SOLVED: To prevent local overheat due to contact with a substrate holder, when a CaF2 lens or the like is heated by radiation, in the process of depositing an antireflection film or the like. SOLUTION: In the process of heating a CaF2 lens R1 , which is sensitive to temperature, by irradiation of IR rays, shielding plates 4, 5 which absorb or reflect IR light are attached across heat insulators 3a, 3b to the upper and lower sides of the substrate holder 1 holding the CaF2 lens R1 , so as to prevent increase in the temperature of the substrate holding part of the substrate holder 1. |
