| 发明名称 |
Photosensitive polyimide precursor compositions |
| 摘要 |
Reducing inhibition of the photochemical crosslinking by including in the photosensitive polyimide precursor composition a metal inhibitor selected from 1H-tetrazole, 1,2-cyclohexenediamine tetraacetic acid hydrate and 5-mercaptobenzimidazole.
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| 申请公布号 |
US6511789(B2) |
申请公布日期 |
2003.01.28 |
| 申请号 |
US20010886626 |
申请日期 |
2001.06.20 |
| 申请人 |
ARCH SPECIALTY CHEMICALS, INC. |
发明人 |
NAIINI AHMAD;RACICOT DONALD;ROZA ANDREW J.;WEBER WILLIAM D.;WATERSON PAMELA J. |
| 分类号 |
G03F7/027;C08G73/10;G03F7/004;G03F7/029;G03F7/037;G03F7/075;(IPC1-7):G03F7/004 |
主分类号 |
G03F7/027 |
| 代理机构 |
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