发明名称 |
Capacitor with high-epsi dielectric or ferroelectric material based on the fin stack principle |
摘要 |
A capacitor in a semiconductor configuration on a substrate includes a noble-metal-containing first capacitor electrode which is formed with a plurality of mutually spaced-apart lamellae. The lamellae are oriented substantially parallel to a surface of the substrate and are mechanically and electrically connected to one another on a flank by a support structure. The capacitor furthermore has a capacitor dielectric formed of high-is in dielectric or ferroelectric material disposed on the first capacitor electrode. The capacitor also has a second capacitor electrode on the capacitor dielectric.
|
申请公布号 |
US6512259(B1) |
申请公布日期 |
2003.01.28 |
申请号 |
US20010863925 |
申请日期 |
2001.05.23 |
申请人 |
INFINEON TECHNOLOGIES AG |
发明人 |
LANGE GERRIT;SCHLOESSER TILL |
分类号 |
H01L27/04;H01L21/02;H01L21/822;H01L21/8242;H01L27/105;H01L27/108;(IPC1-7):H01L27/108 |
主分类号 |
H01L27/04 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|