发明名称 Capacitor with high-epsi dielectric or ferroelectric material based on the fin stack principle
摘要 A capacitor in a semiconductor configuration on a substrate includes a noble-metal-containing first capacitor electrode which is formed with a plurality of mutually spaced-apart lamellae. The lamellae are oriented substantially parallel to a surface of the substrate and are mechanically and electrically connected to one another on a flank by a support structure. The capacitor furthermore has a capacitor dielectric formed of high-is in dielectric or ferroelectric material disposed on the first capacitor electrode. The capacitor also has a second capacitor electrode on the capacitor dielectric.
申请公布号 US6512259(B1) 申请公布日期 2003.01.28
申请号 US20010863925 申请日期 2001.05.23
申请人 INFINEON TECHNOLOGIES AG 发明人 LANGE GERRIT;SCHLOESSER TILL
分类号 H01L27/04;H01L21/02;H01L21/822;H01L21/8242;H01L27/105;H01L27/108;(IPC1-7):H01L27/108 主分类号 H01L27/04
代理机构 代理人
主权项
地址