发明名称 METHOD AND DEVICE FOR THE ELECTROLYTIC TREATMENT OF ELECTRICALLY CONDUCTING STRUCTURES WHICH ARE INSULATED FROM EACH OTHER AND POSITIONED ON THE SURFACE OF ELECTRICALLY INSULATING FILM MATERIALS AND USE OF THE METHOD.
摘要 <p>The invention relates to the electrolytic treatment of electrically conducting structures (4) which are insulated from each other and positioned on the surface of electrically insulating film material (Fo) whereby a method is employed wherein a material is discharged from a reservoir (15 , 15 ) and then transported from a conveyor belt through a treatment unit (1) and brought into contact with said treatment liquid (Fl). During transport, the material (Fo) is moved past at least one electrode device consisting of at least one cathode poled electrode (6) and at least one anode poled electrode (7). At least one cathode poled electrode (6) and at least one anode poled electrode (7) is brought into contact with a treatment liquid (Fl) and connected to an electrical voltage source (8). A current then flows through the electrodes (6, 7) and said electrically conducting structures (4). The electrodes (6, 7) are shielded against each other in such a way that no electrical current can flow between the oppositely poled electrodes (6, 7). The material (Fo) is then loaded into a reservoir (15 , 15 ).</p>
申请公布号 MXPA02002817(A) 申请公布日期 2003.01.28
申请号 MX2002PA02817 申请日期 2000.10.05
申请人 ATOTECH DEUTSCHLAND GMBH 发明人 EGON HEBEL
分类号 C25D5/00;C25D5/18;C25D7/06;C25D17/00;C25D19/00;C25F3/02;C25F7/00;H05K3/07;H05K3/24;(IPC1-7):C25D5/00 主分类号 C25D5/00
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