ALIGNMENT MARK, RETICLE FOR CHARGED PARTICLE BEAM ALIGNER AND CHARGED PARTICLE BEAM EXPOSING METHOD

摘要

PROBLEM TO BE SOLVED: To provide an alignment mark in which positional detection accuracy can be enhanced by increasing variation in the strength of a signal. SOLUTION: The alignment mark being used for optical alignment in a charged particle beam aligner is formed of a level-difference pattern divided into a plurality of level-difference patterns. The level-difference pattern comprises a plurality of line patterns arranged at a specified interval.