发明名称 DISTORTION COMPENSATING METHOD OF ELECTRON-RAY DEFLECTION, ELECTRON-RAY EXPOSURE DEVICE WHICH HAS DEFLECTION DISTORTION COMPENSATING MEANS, AND SCANNING TYPE ELECTRON MICROSCOPE
摘要 PROBLEM TO BE SOLVED: To carry out distortion compensation with high precision in a deflection distortion compensating method, which compensates the deflection distortion at the time of deflecting the electron ray and drawing an image. SOLUTION: Providing a mark pattern which has 2-dimensional periodic structure in order to compensate deflection amount and the distortion during electron-ray scanning, scanning the electron ray so that the mark pattern, which has the periodic structure, may have an angle, making an interference-fringe pattern generate, and observing this interference-fringes pattern make distortion compensation, which has higher accuracy than before, enable.
申请公布号 JP2003022773(A) 申请公布日期 2003.01.24
申请号 JP20010206057 申请日期 2001.07.06
申请人 NEC CORP 发明人 MUROTANI YOSHIHARU
分类号 G03F7/20;H01J37/147;H01J37/153;H01J37/28;H01J37/305;H01L21/027;(IPC1-7):H01J37/153 主分类号 G03F7/20
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