SUBSTRATE TREATMENT DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a substrate treatment device with which accurate control is enabled without vibration and the adjustment of a control system is facilitated even in a heat treatment furnace mutually strongly interfering a plurality of detected temperatures provided respectively corresponding to a plurality of heaters. SOLUTION: Measured temperatures in a plurality of zones are respectively compared with temperature setting values c1-c3 of a plurality of heaters h1-h3 by adders d1-d3, the respective compared results are inputted to a plurality of control units f1-f3, power control signals a1-a3 are operated and the ratio of interference in each of zones is multiplied to the respective operated power control signals a1-a3 by an interference ratio operating part 20 so that a final power control signal can be provided.