发明名称 THIN FILM TRANSISTOR AND METHOD FOR MANUFACTURING THE SAME
摘要 <p>PROBLEM TO BE SOLVED: To provide a thin film transistor whose electric characteristics are excellent. SOLUTION: This thin film transistor is provided with a substrate, a gate electrode formed on the substrate, a gate insulating film formed on the gate electrode, a first semiconductor film including a channel formation region formed on the gate insulating film, a pair of P or N conductivity type semiconductor films formed on the first semiconductor film, and a source electrode and drain electrode formed on the pair of second semiconductor films. The edges of the pair of second semiconductor films and the edges of the first semiconductor film have parts that match, and the pair of second semiconductor films are not partially covered with the source electrode or drain electrode.</p>
申请公布号 JP2003023162(A) 申请公布日期 2003.01.24
申请号 JP20020136929 申请日期 2002.05.13
申请人 SEMICONDUCTOR ENERGY LAB CO LTD 发明人 CHO KOYU;KUSUMOTO NAOTO
分类号 G02F1/1368;H01L21/20;H01L21/268;H01L29/786;(IPC1-7):H01L29/786;G02F1/136 主分类号 G02F1/1368
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