发明名称 FLOATING FOREIGN MATTER DETECTING METHOD, APPARATUS THEREFOR AND SEMICONDUCTOR DEVICE MANUFACTURING APPARATUS
摘要 PROBLEM TO BE SOLVED: To detect foreign matters, floating in a processing chamber by an optical system constituted of one observation window and one unit and to accurately detect weak light scattered by foreign matters. SOLUTION: In forming a thin film on an object to be treated in the treatment chamber or applying processing treatment to the thin film formed on the object to be treated, there are provided the treatment chamber, a laser illumination/scattered light detection optical system mounted on the observation window of the processing chamber, a laser beam source separated from the laser illumination/scattered light detection optical system and a light guide part for guiding the beam from the laser beam source to the laser illumination/scattered light detection optical system. The laser beam, guided to the laser illumination/scattered light detection optical system from the light source separated from the laser illumination/scattered light detection optical system by the light guide part is enabled to irradiate the interior of the treatment chamber from the laser illumination/scattered light detection optical system through the observation window and back scattered light scattered by the foreign matter in the processing chamber by irradiation beam to pass through the observation window, is received.
申请公布号 JP2003021597(A) 申请公布日期 2003.01.24
申请号 JP20010207214 申请日期 2001.07.09
申请人 HITACHI LTD 发明人 NAKANO HIROYUKI;NAKADA TOSHIHIKO
分类号 G01N15/06;G01N21/51;(IPC1-7):G01N21/51 主分类号 G01N15/06
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