CURABLE COMPOSITION FOR ETCHING RESIST

摘要

PROBLEM TO BE SOLVED: To provide a curable composition for an etching resist giving a cured film excellent in etching resistance even in secondary etching at a high temperature and excellent also in suitability to subsequent alkali dissolution and removal and in pattern forming property and suitable for use as a backing material particularly in the manufacture of a shadow mask. SOLUTION: The curable composition contains (a) a compound having one carboxyl group and one (meth)acryloyl group in one molecule and (b) a compound having one or more carboxyl groups and two or more (meth)acryloyl groups in one molecule.