| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for photopolymerizing a high sensitivity photosensitive lithographic printing plate by which light fog is suppressed and improved processing stability is ensured owing to diminished scum in a developing solution, and to provide a plate making method by which the photosensitive lithographic printing plate is developed using a specified developing solution. SOLUTION: In the method for photopolymerizing a photosensitive lithographic printing plate, the photosensitive planographic printing plate containing at least one sensitizing dye represented by a specified structure is exposed with laser light having <=450 nm wavelength. |
