| 摘要 |
PROBLEM TO BE SOLVED: To provide the manufacturing method of a capacitor for reducing a gap that occurs in an interlayer insulating film and for reducing the deterioration of contact performance between a lower electrode and a contact plug. SOLUTION: The contact plug 3 is formed by making it project from the surface of the interlayer insulating film 2, and a stopper layer 4 is formed on it. The projecting distance of the contact plug 3 is made longer than the distance (t) of the thickness direction of the stopper layer 4. Thus, a contact distance (a) between the side 33 of the projecting part 13 of the contact plug 3 and the stopper 4 becomes longer than the distance (t) of the thickness direction of the stopper layer 4. The soaking route of hydrofluoric acid used when an inter-dummy layer film 5 is removed becomes longer than the distance (t) of the thickness direction of the stopper layer 4. Thus, hydrofluoric acid is difficult to soak into the interlayer insulating film 2, and the deterioration of the contact performance of the lower electrode 9 and the contact plug 3 can be reduced. Since the stopper layer has one layer, a contact hole for peripheral circuit, which is opened to the periphery of the capacitor, can easily be formed. |
